= 0.29 Inventors with similar research interests:
Location History:
- Nakakubiki-gun, JP (2002 - 2006)
- Niigata-ken, JP (2004 - 2009)
- Niigata, JP (2014)
- Jyoetsu, JP (2014 - 2015)
- Joetsu, JP (2009 - 2024)
Company Filing History:
75 out of 5,966 
3 out of 1,786 Years Active: 2002-2024
Title: Tomohiro Kobayashi: Pioneering Innovations in Resist Composition
Introduction
Tomohiro Kobayashi is a notable inventor based in Joetsu, Japan, with an impressive portfolio of 75 patents. His work primarily focuses on advanced resist compositions and their applications in photolithography, significantly contributing to the field of semiconductor manufacturing.
Latest Patents
Kobayashi's latest patents detail innovative resist compositions that include resin with acid-labile groups and sophisticated photo-acid generators. These compositions are designed to demonstrate favorable mask dimension dependency and critical dimension uniformity (CDU) in photolithography processes. His work enables better performance when using high-energy light sources, such as ArF and KrF excimer laser beams. The intricate formulations not only enhance the efficiency of the patterning processes but also address challenges related to mask error factors and line width roughness (LWR).
Career Highlights
Throughout his career, Kobayashi has been affiliated with prominent companies in the chemical sector, including Shin-Etsu Chemical Co., Ltd. and Mitsui Chemicals, Inc. His extensive experience in these organizations has allowed him to develop cutting-edge technologies that are integral to modern production methods in the electronics industry.
Collaborations
Kobayashi has collaborated with esteemed colleagues, including Jun Hatakeyama and Koji Hasegawa. Together, they have advanced the research and development of innovative materials and processes that push the boundaries of current technologies in resist applications.
Conclusion
Tomohiro Kobayashi's contributions to the field of resist composition and patterning processes reflect his dedication to innovation and excellence. With a prolific number of patents to his name, he continues to drive advancements in photolithography and semiconductor manufacturing, cementing his status as a leading inventor in the industry.
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