The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Jan. 02, 2014
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Koji Hasegawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); C08F 220/26 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/085 (2006.01); G03F 7/11 (2006.01); G03F 7/32 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/085 (2013.01); G03F 7/11 (2013.01); G03F 7/325 (2013.01); C08F 220/26 (2013.01); C08F 2220/282 (2013.01);
Abstract
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring under the action of an acid so that the polymer may reduce its solubility in an organic solvent displays a high dissolution contrast. A fine hole or trench pattern can be formed therefrom.