The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Dec. 31, 2013
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Kenji Funatsu, Joetsu, JP;
Kentaro Kumaki, Joetsu, JP;
Akihiro Seki, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract
A resist composition comprising a polymer comprising recurring units having an acid labile group of cyclopentyl with tert-butyl or tert-amyl pendant is coated onto a substrate, baked, exposed to high-energy radiation, PEB and developed in an organic solvent to form a negative pattern. A fine hole pattern can be formed from the resist composition with advantages including high dissolution contrast, good size control and wide depth of focus.