Joetsu, Japan

Kenji Funatsu

This inventor holds 21 USPTO granted patents and 24 published patent applications and 3 EPO patents, primarily in Photoresist Technology. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2001-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Funatsu. Retrieved from https://idiyas.com/inventor/kenji-funatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 81.0

 

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 30(Granted Patents)


Location History:

  • Nakakubiki-gun, JP (2001 - 2004)
  • Niigata-ken, JP (2006 - 2007)
  • Joetsu, JP (2010 - 2019)
  • Jyoetsu, JP (2014 - 2020)

Company Filing History:


Years Active: 2001-2025

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Areas of Expertise:
Photoresist
Polymer Composition
Patterning Process
Negative Resist
Positive Resist
Chemically Amplified Resist
Photosensitive Resin
Tetracarboxylic Acid Diester
Cured Film
Shrink Agent
Silylation
21 patents (USPTO):Explore Patents

Title: Kenji Funatsu: Innovator in Advanced Polymer Technology

Introduction: Kenji Funatsu, based in Joetsu, Japan, is a prominent inventor recognized for his significant contributions to polymer technology. With a remarkable portfolio of 20 patents, Funatsu has established himself as a leading figure in the development of advanced materials used in various industrial applications.

Latest Patents: Among his notable inventions are a series of groundbreaking patents aiming to enhance the quality and efficiency of negative resist compositions. His recent patents include the development of a negative resist composition that features a base polymer with repeat units derived from a triple bond-containing maleimide compound. This innovation enables the formation of high-resolution patterns with reduced edge roughness. Additionally, he has created a tetracarboxylic acid diester compound and a polymer of a polyimide precursor, which employs specific structural units to improve performance. His work on negative photosensitive resin composition and related patterning processes also showcases his expertise in advanced materials.

Career Highlights: Kenji Funatsu is currently associated with Shin-Etsu Chemical Co., Ltd., where he continues to push the boundaries of polymer science. His innovative spirit and dedication to research have made significant impacts on the industry, particularly in the field of material development.

Collaborations: Funatsu’s work is further enhanced by collaboration with esteemed colleagues, including Jun Hatakeyama and Koji Hasegawa. Together, they foster a creative environment that drives innovation and contributes to the ongoing advancements in polymer technology.

Conclusion: Kenji Funatsu's contributions to the field of polymer science are remarkable, highlighted by his innovative patents and collaborations. As a forward-thinking inventor, his work continues to facilitate advancements that will shape the future of materials used in various industrial applications. His passion for innovation remains a driving force in his career, ensuring that he remains at the forefront of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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