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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9091933 B1

PDFFull Text
Date of Patent:
Jul. 28, 2015

Filed:

Nov. 16, 2012

Negative pattern forming process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Tomohiro Kobayashi, Joetsu, JP;

Kazuhiro Katayama, Joetsu, JP;

Jun Hatakeyama, Joetsu, JP;

Kenji Funatsu, Joetsu, JP;

Seiichiro Tachibana, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian, LLP

Primary Examiner:

John Chu

Int. Cl.
CPC ...
G03F 7/38 (2006.01); G03F 7/004 (2006.01); C08F 220/34 (2006.01); C08F 220/36 (2006.01); C08F 226/06 (2006.01); C08F 226/10 (2006.01); C08F 228/02 (2006.01); C08F 228/06 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08F 220/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); C08F 220/34 (2013.01); C08F 220/36 (2013.01); C08F 226/06 (2013.01); C08F 226/10 (2013.01); C08F 228/02 (2013.01); C08F 228/06 (2013.01); G03F 7/004 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); C08F 2220/343 (2013.01); C08F 2220/365 (2013.01); C08F 2220/382 (2013.01); C08F 2220/385 (2013.01); C08F 2220/387 (2013.01);
Abstract

A negative pattern is formed by applying a resist composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having an amino group, amide bond, carbamate bond or nitrogen-containing heterocycle, (B) a photoacid generator, and (C) an organic solvent onto a substrate, prebaking, exposing, baking, and selectively dissolving an unexposed region of the resist film in an organic solvent-based developer.

Find Patent Forward Citations

Kobayashi, Tomohiro. (2015). Negative pattern forming process (U.S. Patent No. 9091933). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9091933

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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