The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Dec. 19, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); C08F 228/02 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); C08F 228/02 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0382 (2013.01); G03F 7/168 (2013.01); C08F 2220/1833 (2013.01); C08F 2220/281 (2013.01); C08F 2220/282 (2013.01);
Abstract
A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.