The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2014
Filed:
Feb. 25, 2011
Applicants:
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Inventors:
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 220/22 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); C08F 230/22 (2013.01); Y10S 430/106 (2013.01); Y10S 430/111 (2013.01); Y10S 430/122 (2013.01); Y10S 430/123 (2013.01);
Abstract
A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER.