The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Nov. 09, 2011
Applicants:
Youichi Ohsawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Seiichiro Tachibana, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Inventors:
Youichi Ohsawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Seiichiro Tachibana, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C08F 220/24 (2006.01); C08F 220/38 (2006.01); C08F 228/02 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/38 (2013.01); C08F 220/24 (2013.01); C08F 220/38 (2013.01); C08F 228/02 (2013.01); Y10S 430/106 (2013.01); Y10S 430/111 (2013.01); Y10S 430/122 (2013.01);
Abstract
A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.