The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Feb. 24, 2011
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble base polymer, (B) an acid generator, and (C) a nitrogen-containing compound, the base polymer (A) turning alkali insoluble under the catalysis of acid. A polymer having a fluorinated carboxylic acid onium salt on a side chain is included as the base polymer. Processing the negative resist composition by a lithography process may form a resist pattern with advantages including uniform low diffusion of acid, improved LER, and reduced substrate poisoning.