The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Nov. 23, 2011
Tomohiro Kobayashi, Joetsu, JP;
Eiji Fukuda, Joetsu, JP;
Takayuki Nagasawa, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Eiji Fukuda, Joetsu, JP;
Takayuki Nagasawa, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A positive resist composition comprising (A) a polymer comprising recurring units of a specific structure adapted to generate an acid in response to high-energy radiation and acid labile units, the polymer having an alkali solubility that increases under the action of an acid, and (B) a sulfonium salt of a specific structure exhibits a high resolution in forming fine size patterns, typically trench patterns and hole patterns. Lithographic properties of profile, DOF and roughness are improved.