Location History:
- Niigata-ken, JP (2007 - 2008)
- Joetsu, JP (2014)
Company Filing History:
Years Active: 2007-2014
Title: Eiji Fukuda: Innovator in Lithographic Technology
Introduction
Eiji Fukuda is a prominent inventor based in Niigata-ken, Japan. He has made significant contributions to the field of lithographic technology, particularly in the development of positive resist compositions and methods for forming contact holes. With a total of 3 patents to his name, Fukuda's work has advanced the capabilities of photolithography in semiconductor manufacturing.
Latest Patents
Fukuda's latest patents include a positive resist composition and a fine contact hole forming method. The positive resist composition comprises a polymer that generates an acid in response to high-energy radiation, enhancing alkali solubility under acidic conditions. This innovation allows for high-resolution patterning, improving lithographic properties such as profile, depth of focus (DOF), and roughness. The fine contact hole forming method employs a thermal flow process that ensures consistent contact hole sizes, even when resist material lots change. This method involves several steps, including coating, heating, exposing, and developing the resist material, ultimately leading to precise contact hole patterns.
Career Highlights
Eiji Fukuda has dedicated his career to advancing lithographic technologies. His work at Shin-Etsu Chemical Co., Ltd. has positioned him as a key player in the semiconductor industry. His innovative approaches to resist materials and patterning processes have garnered attention and respect within the field.
Collaborations
Fukuda has collaborated with notable colleagues, including Youichi Ohsawa and Katsuya Takemura. These partnerships have contributed to the successful development of his patented technologies and have fostered a collaborative environment for innovation.
Conclusion
Eiji Fukuda's contributions to lithographic technology through his patents and collaborative efforts have significantly impacted the semiconductor industry. His innovative solutions continue to shape the future of photolithography and semiconductor manufacturing.