The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Jan. 25, 2011
Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
Masaki Ohashi, Jyoetsu, JP;
Satoshi Watanabe, Jyoetsu, JP;
Youichi Ohsawa, Jyoetsu, JP;
Keiichi Masunaga, Jyoetsu, JP;
Takeshi Kinsho, Jyoetsu, JP;
Masaki Ohashi, Jyoetsu, JP;
Satoshi Watanabe, Jyoetsu, JP;
Youichi Ohsawa, Jyoetsu, JP;
Keiichi Masunaga, Jyoetsu, JP;
Takeshi Kinsho, Jyoetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; Rrepresents a divalent hydrocarbon group having 1 to 36 carbon atoms optionally containing a hetero atom; and Rand Reach represents a monovalent hydrocarbon group having 1 to 30 carbon atoms optionally containing a hetero atom or Rand Rmay be bonded with each other to form a ring together with a sulfur atom in the formula. There can be provided a sulfonium salt usable as a resist composition providing high resolution and excellent in LER in photolithography using a high energy beam such as an ArF excimer laser, an EUV light and an electron beam as a light source, a polymer obtained from the sulfonium salt, a resist composition containing the polymer and a patterning process using the resist composition.