The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Aug. 28, 2009
Katsuya Takemura, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Katsuya Takemura, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A double pattern is formed by coating a first positive resist composition onto a substrate, patternwise exposure to radiation, and development with alkaline developer to form a first resist pattern; applying heat and/or radiation to render the first resist pattern insoluble in a second solvent and in a second developer; coating a second resist composition on the first resist pattern, patternwise exposure to radiation, and development with second developer to form a second resist pattern. The resin in the first resist composition comprises recurring units of formula (1) wherein Ris H, CHor CF, m=1 or 2, n=0 or 1.