Tatsushi Ueda

Title: Innovations of Tatsushi Ueda

Introduction

Tatsushi Ueda is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on advanced methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Ueda's latest patents include innovative techniques such as a method of manufacturing semiconductor devices and a substrate processing apparatus. One of his notable inventions involves preparing a substrate that includes a silicon-containing film and a metal film composed of elements like tungsten, titanium, ruthenium, and molybdenum. This technique allows for the simultaneous modification of both the metal and silicon-containing films by supplying reactive species generated through plasma-exciting a processing gas containing hydrogen and oxygen. Another patent details a method that includes accommodating a substrate in a process chamber, supplying a first gas containing oxygen, generating plasma, and processing the substrate with oxidizing species generated by the plasma.

Career Highlights

Throughout his career, Tatsushi Ueda has worked with leading companies in the semiconductor industry, including Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Ueda has collaborated with notable colleagues in his field, including Tadashi Terasaki and Unryu Ogawa. Their combined expertise has contributed to advancements in semiconductor technology.

Conclusion

Tatsushi Ueda's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of modern electronic devices.