The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2020

Filed:

May. 10, 2017
Applicant:

Hitachi Kokusai Electric Inc., Tokyo, JP;

Inventor:

Tatsushi Ueda, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/44 (2006.01); H01L 21/687 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); C23C 16/4405 (2013.01); C23C 16/4408 (2013.01); C23C 16/4412 (2013.01); C23C 16/4584 (2013.01); C23C 16/45551 (2013.01); C23C 16/54 (2013.01); H01L 21/02057 (2013.01); H01L 21/02186 (2013.01); H01L 21/67103 (2013.01); H01L 21/67248 (2013.01); H01L 21/68707 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 21/68785 (2013.01);
Abstract

There is provided a technique that includes: loading substrates into a process chamber and mounting the substrates on a substrate mounting stand, which is installed in the process chamber, along a circumferential direction; maintaining the substrate mounting stand at a substrate processing position; processing the substrates on the substrate mounting stand, which is maintained at the substrate processing position, by supplying a first gas and a second gas from a first gas supply unit and a second gas supply unit, respectively, arranged above the substrate mounting stand while rotating the substrate mounting stand; unloading the substrates from the process chamber; maintaining the substrate mounting stand at a cleaning position; and cleaning the substrate mounting stand, which is maintained at the cleaning position, by supplying a cleaning gas from a third gas supply unit arranged above the substrate mounting stand, wherein the cleaning position is lower than the substrate processing position.


Find Patent Forward Citations

Loading…