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For the Inventor, By the Inventor

Portland, OR, United States of America

Tao Chu

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Mechanicville, NY (US) (2019)
  • Clifton Park, NY (US) (2020 - 2022)
  • Portland, OR (US) (2020 - 2022)

Company Filing History:

goldMedal5 out of 927 
 
Globalfoundries U.S. Inc.
 patents
silverMedal3 out of 5,671 
 
Globalfoundries Inc.
 patents

Years Active: 2019-2022

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):
1. 11404415 - Stacked-gate transistors (2022-08-02),
2. 11315835 - Methods of forming an IC product comprising transistor devices with different threshold voltage levels (2022-04-26),
3. 11264477 - Field-effect transistors with independently-tuned threshold voltages (2022-03-01),
4. 11158635 - Low leakage gate stack for a transistor device and methods of making an IC product that includes such a transistor device (2021-10-26),
5. 10964598 - Methods of forming source/drain regions of a FinFET device and the resulting structures (2021-03-30),
6. 10833169 - Metal gate for a field effect transistor and method (2020-11-10),
7. 10658363 - Cut inside replacement metal gate trench to mitigate N-P proximity effect (2020-05-19),
8. 10446550 - Cut inside replacement metal gate trench to mitigate N-P proximity effect (2019-10-15),

Title: The Innovative Journey of Tao Chu

Introduction

Tao Chu, a renowned inventor based in Portland, Oregon, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of eight patents, his innovations have facilitated advancements in electronic components and integrated circuits.

Latest Patents

Among his latest inventions, Tao has focused on stacked-gate transistors. His patent describes semiconductor structures that include a stacked gate structure composed of multiple transistors, featuring a floating node and a connection to either ground or a supply voltage. This innovative approach introduces methods to manufacture such structures effectively. Another notable patent highlights methods for forming integrated circuit products using transistor devices that exhibit different threshold voltage levels. This method involves a meticulous process of layering and conformal material removal, showcasing his technical prowess and forward-thinking approach in semiconductor design.

Career Highlights

Tao Chu has had an impressive career with significant roles at GlobalFoundries U.S. Inc. and GlobalFoundries Inc. His experience at these leading companies has greatly influenced his approach to innovation, allowing him to develop cutting-edge technologies that enhance performance and efficiency in semiconductor manufacturing.

Collaborations

Throughout his career, Tao has collaborated with esteemed colleagues, including Bingwu Liu and Ayse M. Ozbek. These partnerships have not only enriched his work but have also contributed to the development of groundbreaking technologies in the semiconductor industry.

Conclusion

Tao Chu's achievements exemplify the spirit of innovation and determination in the realm of semiconductor technology. With his substantial patents and collaborative efforts, he continues to pave the way for future advancements, leaving an indelible mark on the industry. As his inventions evolve, they offer exciting possibilities for the future of electronics.

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