IDiyas

For the Inventor, By the Inventor

Fujisawa, Japan

Takashi Mitsuhashi

USPTO Granted Patents = 28 


Average Co-Inventor Count = 3.0

ph-index = 14

Forward Citations = 959(Granted Patents)


Location History:

  • Yokohama, JP (1991)
  • Tokyo, JP (1999)
  • Kanagawa-ken, JP (1998 - 2004)
  • Kanagawa, JP (1995 - 2013)
  • Fujisawa, JP (2004 - 2013)

Company Filing History:

goldMedal11 out of 52,711 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal10 out of 120 
 
D2s, Inc.
 patents
bronzeMedal7 out of 2,542 
 
Cadence Design Systems, Inc.
 patents

Years Active: 1991-2013

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28 patents (USPTO):Explore Patents
1. 8533640 - Method and system for stencil design for particle beam writing (2013-09-10),
2. 8525135 - System and method of electron beam writing (2013-09-03),
3. 8426832 - Cell projection charged particle beam lithography (2013-04-23),
4. 8364452 - Method and system for lithography simulation and measurement of critical dimensions with improved CD marker generation and placement (2013-01-29),
5. 7953582 - Method and system for lithography simulation and measurement of critical dimensions (2011-05-31),
6. 7914954 - Stencil, stencil design system and method for cell projection particle beam lithography (2011-03-29),
7. 7902528 - Method and system for proximity effect and dose correction for a particle beam writing device (2011-03-08),
8. 7901845 - Method for optical proximity correction of a reticle to be manufactured using character projection lithography (2011-03-08),
9. 7897522 - Method and system for improving particle beam lithography (2011-03-01),
10. 7824828 - Method and system for improvement of dose correction for particle beam writers (2010-11-02),
11. 7777204 - System and method of electron beam writing (2010-08-17),
12. 7772575 - Stencil design and method for cell projection particle beam lithography (2010-08-10),
13. 7759027 - Method and system for design of a reticle to be manufactured using character projection lithography (2010-07-20),
14. 7759026 - Method and system for manufacturing a reticle using character projection particle beam lithography (2010-07-20),
15. 7747977 - Method and system for stencil design for particle beam writing (2010-06-29),

Title: Takashi Mitsuhashi - Innovative Inventor from Fujisawa

Introduction: Takashi Mitsuhashi is a renowned inventor hailing from Fujisawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Takashi Mitsuhashi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Mitsuhashi has worked with leading tech companies and research institutions, playing a pivotal role in the development of cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Takashi Mitsuhashi has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and knowledge exchange that has led to the creation of groundbreaking technologies.

Conclusion: Takashi Mitsuhashi's passion for innovation and his relentless pursuit of technological excellence have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the boundaries of what is possible in the world of technology.

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