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San Jose, CA, United States of America

D2s, Inc.

USPTO Granted Patents = 120

EPO Patents = 3

Trademarks = 8

Forward Citations = 794

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40 inventors (with patents filed for the assignee):

Akira Fujimura (100 out of 124 patents)

Harold Robert Zable (25 out of 27 patents)

Nagesh Shirali (19 out of 19 patents)

4. Kazuyuki Hagiwara (15 out of 15 patents)

5. Michael Tucker (15 out of 15 patents)

6. P Jeffrey Ungar (14 out of 40 patents)

7. Lance Glasser (12 out of 28 patents)

8. Ingo Bork (12 out of 12 patents)

9. Ryan Pearman (11 out of 12 patents)

10. Takashi Mitsuhashi (10 out of 28 patents)

11. William E Guthrie (9 out of 11 patents)

12. Robert C Pack (6 out of 9 patents)

13. Abhishek Shendre (5 out of 5 patents)

14. Anatoly Aadamov (5 out of 5 patents)

15. Shohei Matsushita (5 out of 8 patents)

Core Competencies:

Semiconductor Fabrication

Reticle Enhancement Technology

Charged Particle Beam Lithography

Pattern Formation

Dimensional Uniformity

Parasitic Modeling

Multi-Beam Lithography

Animation Generation

Feature Classification

Bias Correction

Design Modeling

Sub-Resolution Assist Features

120 patents: Sort by Forward Citations

1. 12488175 - Methods and systems to determine parasitics for semiconductor or flat panel display fabrication (2025-12-02),

2. 12475283 - Generating and display an animation of a predicted overlap shape in an IC design (2025-11-18),

3. 12412017 - Methods for modeling of a design in reticle enhancement technology (2025-09-09),

4. 12387029 - Computing parasitic values for semiconductor designs (2025-08-12),

5. 12372864 - Methods and systems to determine shapes for semiconductor or flat panel display fabrication (2025-07-29),

6. 12340495 - Method for computational metrology and inspection for patterns to be manufactured on a substrate (2025-06-24),

7. 12340164 - Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate (2025-06-24),

8. 12287567 - Method and system for reticle enhancement technology (2025-04-29),

9. 12248242 - Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate (2025-03-11),

10. 12243712 - Method and system for determining a charged particle beam exposure for a local pattern density (2025-03-04),

11. 12019973 - Method for reticle enhancement technology of a design pattern to be manufactured on a substrate (2024-06-25),

12. 11972187 - Methods for modeling of a design in reticle enhancement technology (2024-04-30),

13. 11953824 - Method for reticle enhancement technology of a design pattern to be manufactured on a substrate (2024-04-09),

14. 11921420 - Method and system for reticle enhancement technology (2024-03-05),

15. 11886166 - Method and system of reducing charged particle beam write time (2024-01-30),

D2S, Inc. is a leading technology company specializing in design-to-silicon (D2S) solutions for electronic devices. With expertise in semiconductor lithography techniques, D2S offers innovative software platforms and services that optimize photomask designs and enhance manufacturing processes. Their cutting-edge solutions enable semiconductor manufacturers to achieve higher yields, reduce costs, and accelerate time-to-market for advanced integrated circuits. For more information, visit their website.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

120 Patents

#91 in San Jose, CA

#715 in California

#3,084 in US

#6,438 in the World

San Jose, CA, United States of America

D2s, Inc.

Forward Citations = 794

40 inventors:

Akira Fujimura (100 out of 124 patents)

Harold Robert Zable (25 out of 27 patents)

Nagesh Shirali (19 out of 19 patents)

4. Kazuyuki Hagiwara (15 out of 15 patents)

5. Michael Tucker (15 out of 15 patents)

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