Company Filing History:
Years Active: 2013-2018
Title: Unveiling the Innovations of Inventor Ingo Bork
Introduction:
Inventor Ingo Bork, based in Mountain View, CA, is a true trailblazer in the field of charged particle beam lithography, with an impressive portfolio of 12 patents to his name.
Latest Patents:
1. Method and system for forming patterns using charged particle beam lithography: This patent discloses a method for mask data preparation, focusing on determining a set of shots to form a pattern on a reticle for optical lithographic processes.
2. Method and system for design of enhanced edge slope patterns for charged particle beam lithography: This patent presents a method for fracturing or mask data preparation to achieve enhanced edge slope patterns for multi-beam charged particle beam writers.
Career Highlights:
Ingo Bork currently contributes his innovative expertise at D2S, Inc., a leading company in the field of lithography technology.
Collaborations:
In his journey of innovation, Ingo Bork has collaborated with esteemed professionals such as Akira Fujimura and Kazuyuki Hagiwara, enriching his projects with diverse perspectives and expertise.
Conclusion:
Inventor Ingo Bork's dedication to advancing charged particle beam lithography through his patents and collaborations is truly commendable, solidifying his position as a visionary in the realm of innovative technology.