The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Feb. 28, 2011
Akira Fujimura, Saratoga, CA (US);
Kazuyuki Hagiwara, Tokyo, JP;
Stephen F. Meier, Sunnyvale, CA (US);
Ingo Bork, Mountain View, CA (US);
Akira Fujimura, Saratoga, CA (US);
Kazuyuki Hagiwara, Tokyo, JP;
Stephen F. Meier, Sunnyvale, CA (US);
Ingo Bork, Mountain View, CA (US);
D2S, Inc., San Jose, CA (US);
Abstract
A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface.