Company Filing History:
Years Active: 2010-2019
Title: Kazuyuki Hagiwara: Innovator in Charged Particle Beam Lithography
Introduction
Kazuyuki Hagiwara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of charged particle beam lithography, holding a total of 15 patents. His work focuses on enhancing the precision and efficiency of lithographic processes used in semiconductor manufacturing.
Latest Patents
Hagiwara's latest patents include a method and system for dimensional uniformity using charged particle beam lithography. This innovative method addresses mask process correction and the formation of patterns on a reticle. The reticle is utilized in optical lithographic processes to create patterns on wafers. His patents detail how the sensitivity of the wafer pattern is calculated concerning changes in the dimensions of the reticle pattern. Additionally, the exposure information is modified to enhance the edge slope of the reticle pattern where sensitivity is high. Another aspect of his work involves fracturing or mask data preparation, where he determines pattern exposure information that can effectively form a pattern on a reticle.
Career Highlights
Kazuyuki Hagiwara is currently employed at D2S, Inc., where he continues to push the boundaries of lithographic technology. His expertise in charged particle beam lithography has positioned him as a key figure in the industry.
Collaborations
Hagiwara has collaborated with notable professionals in his field, including Akira Fujimura and Lance Glasser. These collaborations have further enriched his research and development efforts.
Conclusion
Kazuyuki Hagiwara's contributions to charged particle beam lithography exemplify his innovative spirit and dedication to advancing technology in semiconductor manufacturing. His patents and ongoing work continue to influence the industry significantly.