The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2010

Filed:

Sep. 01, 2008
Applicants:

Akira Fujimura, Saratoga, CA (US);

Lance Glasser, Saratoga, CA (US);

Takashi Mitsuhashi, Kanagawa, JP;

Kazuyuki Hagiwara, Tokyo, JP;

Inventors:

Akira Fujimura, Saratoga, CA (US);

Lance Glasser, Saratoga, CA (US);

Takashi Mitsuhashi, Kanagawa, JP;

Kazuyuki Hagiwara, Tokyo, JP;

Assignee:

D2S, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.


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