The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Sep. 01, 2008
Applicants:
Akira Fujimura, Saratoga, CA (US);
Lance Glasser, Saratoga, CA (US);
Takashi Mitsuhashi, Kanagawa, JP;
Kazuyuki Hagiwara, Tokyo, JP;
Inventors:
Akira Fujimura, Saratoga, CA (US);
Lance Glasser, Saratoga, CA (US);
Takashi Mitsuhashi, Kanagawa, JP;
Kazuyuki Hagiwara, Tokyo, JP;
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for optical proximity correction of a design of a pattern on a surface is disclosed with the method comprising the steps of inputting desired patterns for the substrate and inputting a set of characters some of which are complex characters that may be used for forming the patterns on the surface. A method of creating glyphs is also disclosed.