The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Mar. 11, 2016
Applicant:
D2s, Inc., San Jose, CA (US);
Inventors:
Akira Fujimura, Saratoga, CA (US);
Kazuyuki Hagiwara, Tokyo, JP;
Stephen F. Meier, Sunnyvale, CA (US);
Ingo Bork, Mountain View, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/70 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 7/2061 (2013.01); G03F 7/2063 (2013.01); G06F 17/5009 (2013.01);
Abstract
A method and system for fracturing or mask data preparation are presented in which a set of shots is determined for a multi-beam charged particle beam writer. The edge slope of a pattern formed by the set of shots is calculated. An edge of the pattern which has an edge slope below a target level is identified, and the dosage of a beamlet in a shot in the set of shots is increased to improve the edge slope. The improved edge slope remains less than the target level.