Sunnyvale, CA, United States of America

Stephen F Meier

USPTO Granted Patents = 9 

Average Co-Inventor Count = 4.0

ph-index = 8

Forward Citations = 280(Granted Patents)


Company Filing History:


Years Active: 1997-2017

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9 patents (USPTO):Explore Patents

Title: The Innovations of Stephen F. Meier

Introduction

Stephen F. Meier is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of charged particle beam lithography, holding a total of nine patents. His work focuses on enhancing the precision and fidelity of lithographic processes, which are crucial in the manufacturing of semiconductor devices.

Latest Patents

Among his latest patents is a method and system for the design of enhanced edge slope patterns for charged particle beam lithography. This innovation presents a method for fracturing or mask data preparation, where a set of shots is determined for a multi-beam charged particle beam writer. The edge slope of a pattern formed by these shots is calculated, allowing for the identification of edges with slopes below a target level. The dosage of a beamlet in a shot is then increased to improve the edge slope while ensuring it remains below the target level. Another significant patent involves generating overlapping shots to increase dosage in selected portions of a pattern, thereby improving the fidelity and critical dimension variation of the transferred pattern. Simulation techniques are employed to predict the resulting pattern on the surface.

Career Highlights

Stephen has worked with prominent companies in the industry, including Synopsys, Inc. and D2s, Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in lithography.

Collaborations

Throughout his career, Stephen has collaborated with talented individuals such as Adel Khouja and Shankar Krishnamoorthy. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Stephen F. Meier's contributions to charged particle beam lithography exemplify the impact of innovative thinking in technology. His patents not only enhance manufacturing processes but also pave the way for advancements in the semiconductor industry.

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