The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Sep. 01, 2008
Akira Fujimura, Saratoga, CA (US);
Lance Glasser, Saratoga, CA (US);
Takashi Mitsuhashi, Kanagawa, JP;
Kazuyuki Hagiwara, Tokyo, JP;
Akira Fujimura, Saratoga, CA (US);
Lance Glasser, Saratoga, CA (US);
Takashi Mitsuhashi, Kanagawa, JP;
Kazuyuki Hagiwara, Tokyo, JP;
D2S, Inc., San Jose, CA (US);
Abstract
A method for fracturing or mask data preparation or proximity effect correction is disclosed which comprises the steps of inputting patterns to be formed on a surface, a subset of the patterns being slightly different variations of each other and selecting a set of characters some of which are complex characters to be used to form the number of patterns, and reducing shot count or total write time by use of a character varying technique. A system for fracturing or mask data preparation or proximity effect correction is also disclosed.