The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Aug. 23, 2024
D2s, Inc., San Jose, CA (US);
Donald Oriordan, Sunnyvale, CA (US);
Akira Fujimura, Saratoga, CA (US);
D2S, INC., San Jose, CA (US);
Abstract
Some embodiments provide a method for optimizing a mask layout generated from a design layout of an IC. Based on an initial mask layout for a first layer, the method generates a simulated wafer image including shapes representing IC components of the layer, including a first component that has a relationship with a second component on a second layer of the design layout. The method identifies, in the simulated wafer image, (i) a first set of regions of a first shape of the first component that overlap with a second shape of the second component and (ii) a second set of regions of the first shape that do not overlap with the second shape. To improve overlap between the first shape's first set of regions and the second shape, the method modifies the initial mask layout to produce a modified mask layout.