P Jeffrey Ungar

Title: P Jeffrey Ungar: Innovator in Reticle Enhancement Technology

Introduction

P Jeffrey Ungar, based in Sunnyvale, California, is a prolific inventor with a remarkable portfolio of 37 patents. His contributions primarily focus on advancements in reticle enhancement technology, which plays a crucial role in the semiconductor manufacturing process. Ungar's innovative approaches have positioned him as a prominent figure in his field.

Latest Patents

Among his latest patents, Ungar developed a method for reticle enhancement technology of a design pattern to be manufactured on a substrate. This patent outlines several key steps, including determining an initial mask pattern, calculating a first substrate pattern, and adjusting the set of variable shaped beam (VSB) shots to create an optimized design. Another significant patent details methods for modeling a design in reticle enhancement technology, representing target or predicted wafer patterns as a smooth function captured in a function sample array (FSA). This continuous tone mask (CTM) approach allows for accurate production of wafer patterns across extensive design areas.

Career Highlights

Ungar has held significant roles at renowned companies, including Apple Inc. and D2S, Inc. His work has contributed to groundbreaking advancements in semiconductor technology, notably in the intricate process of photolithography used for chip manufacturing.

Collaborations

Throughout his career, Ungar has collaborated with notable professionals, including Thomas Charles Greening and William C. Athas. These collaborations have facilitated knowledge exchange, further enhancing his innovative contributions to the industry.

Conclusion

P Jeffrey Ungar's innovative patents and collaborative efforts have significantly impacted the field of semiconductor manufacturing. His ongoing work underscores the importance of reticle enhancement technology in the drive for smaller, more efficient electronic devices. With each patent, Ungar continues to push the boundaries of what is possible in his field, solidifying his status as a leading inventor.