The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2024
Filed:
Feb. 27, 2023
Applicant:
D2s, Inc., San Jose, CA (US);
Inventor:
P. Jeffrey Ungar, Belmont, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/39 (2020.01); G03F 1/36 (2012.01); G03F 1/44 (2012.01); G03F 7/00 (2006.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/39 (2020.01); G03F 1/36 (2013.01); G03F 1/44 (2013.01); G03F 7/705 (2013.01); G06F 2119/18 (2020.01);
Abstract
Methods for reticle enhancement technology include representing a target wafer pattern or a predicted wafer pattern as a smooth function captured as a function sample array (FSA). The FSA is an array of sampled values of the smooth function, which is a continuous differentiable function. Methods also include providing a continuous tone mask (CTM), wherein the CTM is used to produce the predicted wafer pattern, the predicted wafer pattern spanning an entire design area.