The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Jan. 20, 2021
Applicant:
D2s, Inc., San Jose, CA (US);
Inventors:
P. Jeffrey Ungar, Belmont, CA (US);
Hironobu Matsumoto, Kanagawa, JP;
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/39 (2020.01); G03F 7/20 (2006.01); G03F 1/44 (2012.01); G03F 1/36 (2012.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/39 (2020.01); G03F 1/36 (2013.01); G03F 1/44 (2013.01); G03F 7/705 (2013.01); G06F 2119/18 (2020.01);
Abstract
Methods for iteratively optimizing a two-dimensioned tiled area such as a lithographic mask include determining a halo area around each tile in the tiled area. An extended tile is made of a tile and a halo area. Each extended tile in the tiled area is iterated until a criterion is satisfied or a maximum number of iterations is met. Optimizing the extended tile produces a pattern for the tile such that at a perimeter of the tile, the pattern matches adjacent patterns that are calculated at perimeters of adjacent tiles.