Hironobu Matsumoto is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of reticle enhancement technology, holding a total of 14 patents. His work focuses on optimizing designs for lithographic masks, which are crucial in the semiconductor manufacturing process.

Latest Patents

Matsumoto's latest patents involve methods for modeling designs in reticle enhancement technology. These methods include iteratively optimizing a two-dimensional tiled area, such as a lithographic mask. The process involves determining a halo area around each tile in the tiled area. An extended tile is created from a tile and its corresponding halo area. Each extended tile is iterated until a specific criterion is met or a maximum number of iterations is reached. This optimization produces a pattern for the tile that aligns with adjacent patterns calculated at the perimeters of neighboring tiles.

Career Highlights

Throughout his career, Hironobu Matsumoto has worked with notable companies, including Nuflare Technology, Inc. and D2s, Inc. His expertise in reticle enhancement technology has positioned him as a key figure in the industry, contributing to advancements that enhance the precision of semiconductor manufacturing.

Collaborations

Matsumoto has collaborated with several professionals in his field, including P Jeffrey Ungar and Shigehiro Hara. These collaborations have further enriched his work and contributed to the development of innovative solutions in reticle enhancement technology.

Conclusion

Hironobu Matsumoto's contributions to reticle enhancement technology and his impressive portfolio of patents underscore his role as a leading inventor in the semiconductor industry. His innovative methods continue to influence the field and drive advancements in lithographic design.

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