The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Feb. 12, 2015
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventor:

Hironobu Matsumoto, Kanagawa, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); H01J 37/3174 (2013.01); H01J 37/3175 (2013.01); H01J 2237/1504 (2013.01); H01J 2237/31762 (2013.01); H01J 2237/31764 (2013.01); H01J 2237/31776 (2013.01);
Abstract

A charged particle beam writing apparatus includes plural conversion processing units to perform data conversion processing in parallel for writing data of each processing region obtained by virtually dividing the writing region of a target object into plural processing regions, a transmission unit to input a part of processing data of one of the plural processing regions for which data conversion processing has been performed, one part at a time, totally as n divided processing data, and sequentially transmit the n divided processing data such that the (n−1) th divided processing data is transmitted while the n-th divided processing data is being input, a deflection control circuit to control a deflection amount for deflecting a charged particle beam, based on one of the n divided processing data transmitted sequentially, and a writing unit to write a pattern by deflecting the charged particle beam based on the deflection amount.


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