The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
May. 07, 2024
D2s, Inc., San Jose, CA (US);
Akira Fujimura, Saratoga, CA (US);
P. Jeffrey Ungar, Belmont, CA (US);
Nagesh Shirali, San Jose, CA (US);
D2S, Inc., San Jose, CA (US);
Abstract
Systems for reticle enhancement technology (RET) for use with variable shaped beam (VSB) lithography include a device configured to determine an initial mask pattern from a desired pattern for a substrate; a device configured to calculate a first substrate pattern from the initial mask pattern; a device configured to determine an initial set of VSB shots based on the initial mask pattern; a device configured to calculate a second substrate pattern from a simulated mask pattern calculated with the initial set of VSB shots; a device configured to compare the first substrate pattern with the second substrate pattern; and a device configured to adjust the initial set of VSB shots until the second substrate pattern and the first substrate pattern are within a predetermined tolerance, creating an adjusted set of VSB shots.