The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Mar. 15, 2024
Applicant:
D2s, Inc., San Jose, CA (US);
Inventor:
P. Jeffrey Ungar, Belmont, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/39 (2020.01); G03F 1/36 (2012.01); G03F 1/44 (2012.01); G03F 7/00 (2006.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/39 (2020.01); G03F 1/36 (2013.01); G03F 1/44 (2013.01); G03F 7/705 (2013.01); G06F 2119/18 (2020.01);
Abstract
Methods for reticle enhancement technology include inputting a target wafer pattern, the target wafer pattern spanning an entire design area, and iterating a proposed mask for the entire design area until the proposed mask meets criteria towards producing the target wafer pattern. Each iteration includes calculating a predicted wafer pattern from the proposed mask. The calculating comprises calculating a cost and derivative data, the cost and the derivative data being based on comparing the predicted wafer pattern to the target wafer pattern. The cost further comprises specifications for mask manufacturability.