The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Aug. 23, 2024
D2s, Inc., San Jose, CA (US);
Donald Oriordan, Sunnyvale, CA (US);
Akira Fujimura, Saratoga, CA (US);
D2S, INC., San Jose, CA (US);
Abstract
Some embodiments provide a method for modifying a mask layout for producing masks used to manufacture an IC. The method identifies a first set of mask images corresponding to a first layer and a second set of mask images corresponding to a second layer. The method formulates a problem that expresses correlation between desired shapes of IC components and predicted as-manufactured shapes of the IC components. The IC components include components on the first layer and vias on the second layer, each via connecting a first-layer component to a component on another layer. The method solves the problem by iteratively exploring modifications to both the first and second sets of mask images to identify modified sets of mask images that result in predicted as-manufactured shapes for the components on the first layer and the vias on the second layer that sufficiently correlate to the desired shapes of the IC components.