The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Sep. 02, 2009
Kenji Yoshida, Tokyo, JP;
Takashi Mitsuhashi, Kanagawa, JP;
Shohei Matsushita, Kanagawa, JP;
Larry Lam Chau, Fremont, CA (US);
Tam Dinh Thanh Nguyen, Fremont, CA (US);
Donald Macmillen, Hillsborough, CA (US);
Akira Fujimura, Saratoga, CA (US);
Kenji Yoshida, Tokyo, JP;
Takashi Mitsuhashi, Kanagawa, JP;
Shohei Matsushita, Kanagawa, JP;
Larry Lam Chau, Fremont, CA (US);
Tam Dinh Thanh Nguyen, Fremont, CA (US);
Donald MacMillen, Hillsborough, CA (US);
Akira Fujimura, Saratoga, CA (US);
D2S, Inc., San Jose, CA (US);
Abstract
The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP characters with one or more optional characters between the two characters, wherein the optional characters can form meaningful patterns on a surface only in combination with one of the two characters. A stencil is also disclosed wherein the blanking area of a CP character extends beyond the boundary of the stencil's available character area. Methods for design of the aforementioned stencils are also disclosed.