The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Nov. 21, 2006
Applicants:
Kenji Yoshida, Tokyo, JP;
Takashi Mitsuhashi, Fujisawa, JP;
Shohei Matsushita, Yokohama, JP;
Akira Fujimura, Saratoga, CA (US);
Inventors:
Kenji Yoshida, Tokyo, JP;
Takashi Mitsuhashi, Fujisawa, JP;
Shohei Matsushita, Yokohama, JP;
Akira Fujimura, Saratoga, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and system for particle beam lithography, such as electron beam (EB) lithography, is disclosed. The method and system include selecting one of a plurality of cell patterns from a stencil mask and partially exposing the cell pattern to a particle beam, such as an electron beam, so as to selectively project a portion of the cell pattern on a substrate.