The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Feb. 23, 2007
Applicant:

Takashi Mitsuhashi, Fujisawa, JP;

Inventor:

Takashi Mitsuhashi, Fujisawa, JP;

Assignee:

Cadence Design Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06G 7/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system for lithography simulation and measurement of critical dimensions with improved CD marker generation and placement is disclosed. The method and system specify a position for measuring a difference between a lithography image and a target pattern, generate one or more CD marker candidates, and select at least one CD marker from the one or more CD marker candidates.


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