The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Nov. 30, 2006
Applicants:
Dmitri Lapanik, Yokohama, JP;
Shohei Matsushita, Yokohama, JP;
Takashi Mitsuhashi, Fujisawa, JP;
Zhigang Wu, Yokohama, JP;
Inventors:
Dmitri Lapanik, Yokohama, JP;
Shohei Matsushita, Yokohama, JP;
Takashi Mitsuhashi, Fujisawa, JP;
Zhigang Wu, Yokohama, JP;
Assignee:
Cadence Design Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
Lapanik, Dmitri. (2010). System and method of electron beam writing (U.S. Patent No. 7777204). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7777204
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile