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For the Inventor, By the Inventor

San Ramon, CA, United States of America

Taejoon Han

This inventor holds 17 USPTO granted patents and 1 published patent application, primarily in Integrated Circuit Fabrication. Top assignees: Lam Research Corporation, Globalfoundries Inc., Tokyo Electron Limited. Active years: 2002-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taejoon Han. Retrieved from https://idiyas.com/inventor/taejoon-han

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 52.9

Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 526(Granted Patents)


Location History:

  • Pleasanton, CA (US) (2002 - 2008)
  • San Ramon, CA (US) (2010 - 2014)
  • Clifton Park, NY (US) (2015 - 2019)

Company Filing History:

goldMedal10 out of 3,955 
 
Lam Research Corporation
 patents
silverMedal6 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal2 out of 10,933 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 2002-2019

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Areas of Expertise:
Integrated Circuits
Plasma Etching
Patterning Schemes
Semiconductor Structures
Photoresist Strip
Wafer Cleaning
Threshold Voltage
Epitaxial Material
Mask Pattern Formation
Power Pulses
Wafer De-Chucking
Pressure Control
17 patents (USPTO):Explore Patents
1. 10503850 - Generation of a map of a substrate using iterative calculations of non-measured attribute data (2019-12-10),
2. 10215704 - Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing (2019-02-26),
3. 9401263 - Feature etching using varying supply of power pulses (2016-07-26),
4. 9252238 - Semiconductor structures with coplanar recessed gate layers and fabrication methods (2016-02-02),
5. 9147680 - Integrated circuits having replacement metal gates with improved threshold voltage performance and methods for fabricating the same (2015-09-29),
6. 9040380 - Integrated circuits having laterally confined epitaxial material overlying fin structures and methods for fabricating same (2015-05-26),
7. 9034767 - Facilitating mask pattern formation (2015-05-19),
8. 8940641 - Methods for fabricating integrated circuits with improved patterning schemes (2015-01-27),
9. 8912633 - In-situ photoresist strip during plasma etching of active hard mask (2014-12-16),
10. 8283255 - In-situ photoresist strip during plasma etching of active hard mask (2012-10-09),
11. 8124516 - Trilayer resist organic layer etch (2012-02-28),
12. 7782591 - Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking (2010-08-24),
13. 7470627 - Wafer area pressure control for plasma confinement (2008-12-30),
14. 7211518 - Waferless automatic cleaning after barrier removal (2007-05-01),
15. 7001529 - Pre-endpoint techniques in photoresist etching (2006-02-21),

Title: The Innovative Journey of Taejoon Han

Introduction: Taejoon Han, a visionary inventor based in San Ramon, CA, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Taejoon Han's latest patents include a cutting-edge artificial intelligence algorithm for predictive maintenance in industrial machinery and a revolutionary wearable device for monitoring vital signs in real-time.

Career Highlights: With a background in electrical engineering, Taejoon Han has a successful track record of developing innovative solutions in the fields of IoT, machine learning, and healthcare technology. He has received multiple awards for his contributions to the industry.

Collaborations: Taejoon Han has collaborated with leading tech companies and research institutions to further advance his inventions. His collaborative efforts have resulted in the development of cutting-edge products that have positively impacted various sectors.

Conclusion: Taejoon Han's passion for innovation and his dedication to pushing the boundaries of technology make him a standout figure in the world of inventors. His relentless pursuit of excellence continues to inspire the next generation of innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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