The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
Sep. 19, 2013
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Xiang Hu, Clifton Park, NY (US);
Gabriel Padron Wells, Saratoga Springs, NY (US);
Jack Chao-Hsu Chang, Clifton Park, NY (US);
Mingmei Wang, Clifton Park, NY (US);
Taejoon Han, Clifton Park, NY (US);
Assignee:
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32146 (2013.01); H01J 37/32174 (2013.01); H01L 21/3065 (2013.01); H01L 21/32137 (2013.01); H01J 2237/3341 (2013.01); H01J 2237/3348 (2013.01);
Abstract
Etching a feature of a structure by an etch system is facilitated by varying supply of radio frequency (RF) power pulses to the etch system. The varying provides at least one RF power pulse, of the supplied RF power pulses, that deviates from one or more other RF power pulses, of the supplied RF power pulses, by at least one characteristic.