Watervliet, NY, United States of America

Tadahiro Ishizaka

USPTO Granted Patents = 60 

Average Co-Inventor Count = 2.4

ph-index = 11

Forward Citations = 1,796(Granted Patents)

DiyaCoin DiyaCoin 1.89 


Inventors with similar research interests:


Location History:

  • Albany, NY (US) (2008 - 2010)
  • Waterlivet, NY (US) (2010)
  • Kofu, JP (2012)
  • Watervliet, NY (US) (2008 - 2014)
  • Clifton Park, NY (US) (2008 - 2015)
  • Tokyo, JP (2017)
  • Hokuto, JP (2017 - 2018)
  • Yamanashi, JP (2011 - 2021)
  • Nirasaki, JP (2006 - 2022)

Company Filing History:


Years Active: 2006-2022

where 'Filed Patents' based on already Granted Patents

60 patents (USPTO):

Title: Innovations by Tadahiro Ishizaka: Pioneering Patents in Surface Processing

Introduction: Tadahiro Ishizaka, an inventive force located in Watervliet, New York, is recognized for his substantial contributions to the field of surface processing technologies. With an impressive portfolio of 60 patents, Ishizaka has demonstrated his expertise in developing innovative methods and systems that enhance various manufacturing processes.

Latest Patents: Among Ishizaka's notable inventions are two recent patents that focus on advancements in surface processing. The first, titled "Surface Processing Method and Processing System," outlines a method for treating substrates with metal layers in insulating films. This innovative approach involves supplying a halogen-containing gas into a processing chamber, effectively removing metal oxide from the bottom of the substrate's recess.

The second patent, "Embedding Method and Processing System," describes a procedure that includes removing the metal oxide film from the surface of a metal layer in a substrate. It introduces a novel technique for embedding ruthenium in the recess, forming a ruthenium liner film, and further enhancing the substrate with additional ruthenium embedding.

Career Highlights: Tadahiro Ishizaka's professional journey is marked by his role at Tokyo Electron Limited, a leader in the semiconductor and flat panel display industries. His work has significantly advanced the company's technological capabilities in surface processing, making him a key figure in pioneering innovative solutions that cater to modern manufacturing demands.

Collaborations: Throughout his career, Ishizaka has collaborated with talented professionals, including his coworkers Yasushi Mizusawa and Shigeru Mizuno. These partnerships have fostered a collaborative environment that encourages creativity and the exchange of ideas, ultimately leading to the development of groundbreaking technologies.

Conclusion: Tadahiro Ishizaka exemplifies the spirit of innovation and dedication to advancing technology in surface processing. With a robust patent portfolio and significant contributions to the industry, he continues to inspire future generations of inventors and researchers aiming to push the boundaries of what is possible in manufacturing.

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