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For the Inventor, By the Inventor

Cupertino, CA, United States of America

Shih Chung Chen

This inventor holds 32 USPTO granted patents and 12 published patent applications and 1 EPO patent, primarily in Semiconductor Technology. Top assignee: Applied Materials, Inc.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shih Chung Chen. Retrieved from https://idiyas.com/inventor/shih-chung-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 81.3

 

Average Co-Inventor Count = 7.9

ph-index = 4

Forward Citations = 51(Granted Patents)


Company Filing History:

goldMedal32 out of 14,433 
 
Applied Materials, Inc.
 patents

Years Active: 2013-2026

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Areas of Expertise:
Titanium Nitride
Semiconductor Structures
PMOS Transistor
NMOS Device
Low Resistivity Contacts
Dielectric Selectivity
Gate Resistance
Doping Engineering
High-k Reliability
Atomic Layer Deposition
Multi-threshold Voltage
Aluminum Alloys
32 patents (USPTO):Explore Patents
1. 12753498 - Methods of growing metal-containing films (2026-10-06),
2. 12721067 - Titanium nitride gapfill processes for semiconductor devices (2026-08-25),
3. 12721059 - Titanium nitride gapfill processes for semiconductor structures (2026-08-25),
4. 12666695 - Methods of improving PMOS transistor performance (2026-06-23),
5. 12660271 - Method of reducing metal gate resistance for next generation NMOS device application (2026-06-16),
6. 12588443 - Methods for forming low resistivity contacts (2026-03-24),
7. 12328872 - Liner for V-NAND word line stack (2025-06-10),
8. 12305278 - Method of reducing titanium nitride etching during tungsten film formation (2025-05-20),
9. 12062545 - Fluorine-free tungsten ALD for dielectric selectivity improvement (2024-08-13),
10. 11996455 - P-type dipole for P-FET (2024-05-28),
11. 11888045 - Integrated dipole flow for transistor (2024-01-30),
12. 11776980 - Methods for reflector film growth (2023-10-03),
13. 11658218 - P-type dipole for p-FET (2023-05-23),
14. 11552082 - Reducing gate induced drain leakage in DRAM wordline (2023-01-10),
15. 11476267 - Liner for V-NAND word line stack (2022-10-18),

Title: The Innovative Journey of Shih Chung Chen

Introduction: Shih Chung Chen, a pioneering female inventor hailing from Cupertino, CA, has made significant contributions to the world of technology through her groundbreaking inventions and patents.

Latest Patents: Shih Chung Chen's latest patents include a cutting-edge wearable technology device that revolutionizes the healthcare industry by monitoring vital signs in real-time, and a sustainable energy solution that harnesses solar power more efficiently.

Career Highlights: With a career spanning over two decades, Shih Chung Chen has established herself as a leading figure in the tech innovation sector. Her work has been recognized globally, earning her prestigious awards for her inventive spirit and dedication to improving lives through technology.

Collaborations: Throughout her career, Shih Chung Chen has collaborated with top research institutions and universities to further her research and bring her inventions to life. Her partnerships with industry experts have led to the development of groundbreaking technologies that have reshaped various sectors.

Conclusion: Shih Chung Chen's relentless pursuit of innovation and her passion for creating solutions to real-world problems have solidified her position as a trailblazer in the field of technology. Her work continues to inspire future generations of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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