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For the Inventor, By the Inventor

Cupertino, CA, United States of America

Shih Chung Chen

USPTO Granted Patents = 26 

 

Average Co-Inventor Count = 7.7

ph-index = 4

Forward Citations = 39(Granted Patents)


Company Filing History:

goldMedal26 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2013-2025

where 'Filed Patents' based on already Granted Patents

26 patents (USPTO):
1. 12328872 - Liner for V-NAND word line stack (2025-06-10),
2. 12305278 - Method of reducing titanium nitride etching during tungsten film formation (2025-05-20),
3. 12062545 - Fluorine-free tungsten ALD for dielectric selectivity improvement (2024-08-13),
4. 11996455 - P-type dipole for P-FET (2024-05-28),
5. 11888045 - Integrated dipole flow for transistor (2024-01-30),
6. 11776980 - Methods for reflector film growth (2023-10-03),
7. 11658218 - P-type dipole for p-FET (2023-05-23),
8. 11552082 - Reducing gate induced drain leakage in DRAM wordline (2023-01-10),
9. 11476267 - Liner for V-NAND word line stack (2022-10-18),
10. 11289579 - P-type dipole for p-FET (2022-03-29),
11. 11245022 - Integrated dipole flow for transistor (2022-02-08),
12. 11171047 - Fluorine-doped nitride films for improved high-k reliability (2021-11-09),
13. 11075276 - Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors (2021-07-27),
14. 11062900 - Method of reducing effective oxide thickness in a semiconductor structure (2021-07-13),
15. 10790287 - Reducing gate induced drain leakage in DRAM wordline (2020-09-29),

Title: The Innovative Journey of Shih Chung Chen

Introduction: Shih Chung Chen, a pioneering female inventor hailing from Cupertino, CA, has made significant contributions to the world of technology through her groundbreaking inventions and patents.

Latest Patents: Shih Chung Chen's latest patents include a cutting-edge wearable technology device that revolutionizes the healthcare industry by monitoring vital signs in real-time, and a sustainable energy solution that harnesses solar power more efficiently.

Career Highlights: With a career spanning over two decades, Shih Chung Chen has established herself as a leading figure in the tech innovation sector. Her work has been recognized globally, earning her prestigious awards for her inventive spirit and dedication to improving lives through technology.

Collaborations: Throughout her career, Shih Chung Chen has collaborated with top research institutions and universities to further her research and bring her inventions to life. Her partnerships with industry experts have led to the development of groundbreaking technologies that have reshaped various sectors.

Conclusion: Shih Chung Chen's relentless pursuit of innovation and her passion for creating solutions to real-world problems have solidified her position as a trailblazer in the field of technology. Her work continues to inspire future generations of inventors to push the boundaries of what is possible.

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