Location History:
- Dallas, TX (US) (1995 - 1999)
- Richardson, TX (US) (1996 - 2020)
Company Filing History:
12 out of 29,263 
11 out of 203 
Years Active: 1995-2025
Title: Innovations and Contributions of Sharad Saxena
Introduction
Sharad Saxena, based in Richardson, TX, has made significant contributions to the field of semiconductor technology, holding an impressive 22 patents. His work primarily focuses on methodologies and structures that enhance the performance and measurement in fully depleted silicon-on-insulator technologies.
Latest Patents
Among his latest patents, Sharad Saxena has developed innovative solutions such as:
1. **Test Structures for Measuring Silicon Thickness in Fully Depleted Silicon-on-Insulator Technologies**: This patent describes test structures and methods specifically designed for accurate measurements of silicon thickness, crucial for optimizing device performance in modern semiconductor applications.
2. **Method for Applying Charge-Based Capacitance Measurement with Switches Using Only NMOS or Only PMOS Transistors**: This invention details a unique charge-based capacitance measurement (CBCM) technique that operates solely with PMOS or NMOS transistors. Its significance lies in its ability to monitor integrated circuit device performance by utilizing a metrology structure that allows the precise charging and discharging of the device under test through a non-overlapping clock mechanism.
Career Highlights
Sharad has worked with notable companies including Texas Instruments Corporation and Pdf Solutions, Incorporated, where he applied his expertise to advance semiconductor device technologies. His innovative approach to engineering and his commitment to research have consistently positioned him at the forefront of technology development.
Collaborations
Throughout his career, Sharad has collaborated with distinguished professionals in the field, including colleagues like Purnendu K. Mozumder and Richard Gene Burch. These collaborations have contributed to the refinement and implementation of advanced methodologies in semiconductor technologies.
Conclusion
Sharad Saxena’s extensive patent portfolio and his work in the semiconductor industry underscore his vital contributions to technology advancements. His innovative patents not only enhance measurement techniques in silicon-on-insulator technologies but also pave the way for future developments in the field. Sharad’s career is a testament to the impact that dedicated inventors can make in driving innovation and fostering progress in engineering.