Niskayuna, NY, United States of America

Ruqiang Bao

This inventor holds 194 USPTO granted patents and 30 published patent applications and 1 EPO patent, primarily in Transistor Technology (CPC class H01L29-66545). Top assignees: International Business Machines Corporation, Globalfoundries Inc., Ulvac, Inc.. Active years: 2016-2026.

USPTO Granted Patents = 194 

% Patents Active = 76.8

 

Average Co-Inventor Count = 3.8

ph-index = 12

Forward Citations = 555(Granted Patents)

Forward Citations (Not Self Cited) = 445(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Nisakayuna, NY (US) (2018)
  • Nishayuna, NY (US) (2020)
  • Wappingers Falls, NY (US) (2016 - 2022)
  • Niskayuna, NY (US) (2017 - 2024)

Company Filing History:


Years Active: 2016-2026

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Areas of Expertise:
Stacked FETs
Gate-All-Around Transistors
Multi-Threshold Voltage
Dielectric Isolation
Nanosheet Devices
Vertical Transport FET
Phase Change Memory
Contact Resistance Reduction
Self-Aligned Metal Gate
Fin Field Effect Transistor
High-κ Dielectric Layers
Transistor Scaling
194 patents (USPTO):Explore Patents

Title: Ruqiang Bao: Pioneering Innovations in Semiconductor Devices

Introduction:

In the ever-evolving field of semiconductor devices, groundbreaking inventions and patents often pave the way for technological advancements. Ruqiang Bao, a prolific inventor based in Niskayuna, NY, has made significant contributions to the field throughout his career. With an impressive number of patents under his belt and collaborations with renowned companies and fellow experts, Bao's expertise and ingenuity have greatly influenced the industry.

Latest Patents:

Bao's latest patents demonstrate his keen focus on improving the performance and functionality of semiconductor devices. One notable invention is the "Fin structure for vertical transport field effect transistor." This semiconductor device includes a unique fin structure with symmetric first and second fin structures, enhancing the device's overall efficiency and performance.

Another recent patent, "Multi-threshold voltage non-planar complementary metal-oxide-semiconductor devices," showcases Bao's innovative approach to device design. By incorporating an interfacial layer, dipole layer, and gate dielectric layer, these devices allow for different threshold voltage levels, enabling flexibility in circuit design.

Career Highlights:

Throughout his career, Ruqiang Bao has held positions at renowned companies known for their contributions to the semiconductor industry. With his expertise, he has made significant advancements in their research and development efforts. Bao has notably worked at IBM (International Business Machines Corporation) and Globalfoundries Inc., where he has contributed to groundbreaking innovations.

Collaborations:

Collaboration is key in the world of innovation, and Bao has had the opportunity to work alongside brilliant minds within the industry. Among his esteemed coworkers are Choonghyun Lee and Hemanth Jagannathan. With their combined efforts, they have further pushed the boundaries of semiconductor technology, setting new standards and pioneering advancements.

Conclusion:

Ruqiang Bao's exceptional career in the field of semiconductor devices stands as a testament to his dedication and inventiveness. With 166 patents to his name and a focus on enhancing performance and functionality, Bao's contributions continue to have a significant impact on the industry. Through collaborations with industry giants like IBM and Globalfoundries Inc., he has forged new paths in semiconductor research and development. As the industry progresses, it is innovators like Ruqiang Bao who drive the advancements that shape our technological future.

Profile summary based on public USPTO records.
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