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For the Inventor, By the Inventor

Chigasaki, Japan

Ulvac, Inc.


USPTO Granted Patents = 446

% Expired Patents = 18.4



Trademarks = 15

Forward Citations = 1,358

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687 inventors (with patents filed for the assignee):

goldMedal Kyuzo Nakamura (23 out of 43 patents)

silverMedal Yoshinori Fujii (22 out of 22 patents)

bronzeMedal Koukou Suu (19 out of 20 patents)

4.  Satoru Ishibashi (19 out of 21 patents)

5.  Hirofumi Minami (17 out of 19 patents)

6.  Hiroshi Nagata (16 out of 48 patents)

7.  Shinya Nakamura (14 out of 28 patents)

8.  Satoru Takasawa (14 out of 14 patents)

9.  Noriaki Tani (14 out of 23 patents)

10.  Yoshinori Shingaki (12 out of 12 patents)

11.  John Rozen (11 out of 50 patents)

12.  Yohei Ogawa (11 out of 15 patents)

13.  Ryuichiro Kamimura (11 out of 11 patents)

14.  Michio Ishikawa (11 out of 12 patents)

15.  Junpei Yuyama (11 out of 15 patents)


Core Competencies:
Plasma Processing
Sputtering Apparatus
Deposition Methods
Etching Method
Thin Film Transistor
Vacuum Evaporation
Silicon Nitride Film
Ion Source
Chemical Vapor Deposition
Magnetron Sputtering
Freeze-Drying Device
Oxide Semiconductor

446 patents:

1. 12744188 - Etching method (2026-09-22),
2. 12736943 - Information processing device and information processing method (2026-09-15),
3. 12668869 - Evaporation source for vacuum evaporation apparatus (2026-06-30),
4. 12614698 - Plasma processing apparatus and plasma processing method (2026-04-28),
5. 12606903 - Vacuum evaporation method (2026-04-21),
6. 12476090 - Method of depositing silicon nitride film, apparatus for depositing film, and silicon nitride film (2025-11-18),
7. 12469711 - Etching method (2025-11-11),
8. 12293905 - Cathode unit for magnetron sputtering apparatus and magnetron sputtering apparatus (2025-05-06),
9. 12288709 - Vacuum processing apparatus and vacuum processing method using the same (2025-04-29),
10. 12217969 - Silicon dry etching method (2025-02-04),
11. 12205795 - Plasma processing device (2025-01-21),
12. 12169886 - Display device, display method, and storage medium (2024-12-17),
13. 12112929 - Cathode unit for magnetron sputtering apparatus and magnetron sputtering apparatus (2024-10-08),
14. 12092398 - Freeze-drying device and freeze-drying method (2024-09-17),
15. 12040153 - Ion gun (2024-07-16),
Ulvac, Inc., headquartered in Chigasaki, Japan, specializes in vacuum processing technologies essential for various industrial applications. The company is renowned for its advancements in plasma processing, sputtering apparatus, and deposition methods, which are critical in the production of thin film transistors and silicon nitride films. Ulvac's expertise extends to etching methods and vacuum evaporation, positioning it as a key player in the semiconductor and electronics sectors, where precision and innovation are paramount.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Sep 29 2026

Ulvac, Inc.
446 Patents

#1 in Chigasaki

#411 in Japan

#2,135 in the World

Chigasaki, JP
Chigasaki, Japan

Ulvac, Inc.

Forward Citations = 1,358

687 inventors:

goldMedal Kyuzo Nakamura (23 out of 43 patents)

silverMedal Yoshinori Fujii (22 out of 22 patents)

bronzeMedal Koukou Suu (19 out of 20 patents)

4.  Satoru Ishibashi (19 out of 21 patents)

5.  Hirofumi Minami (17 out of 19 patents)

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