The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Aug. 05, 2024
Ulvac, Inc., Chigasaki, JP;
Kazuhiko Tonari, Chigasaki, JP;
Youhei Ono, Chigasaki, JP;
Jinhyeok Son, Pyeongtaek Si, KR;
Jun-Chang Park, Pyeongtaek-Si, KR;
Hyunhwa Lee, Pyeongtaek-Si, KR;
Jinju Bae, Pyeongtaek-Si, KR;
ULVAC, INC., Chigasaki, JP;
Abstract
An etching method includes generating reactive plasma containing hydrogen and nitrogen in a discharge tube having an inner surface formed from an inorganic oxide and supplying the reactive plasma to a processing chamber connected to the discharge tube, and generating a precursor containing fluorine and hydrogen in the processing chamber using the reactive plasma and a gas containing fluorine and supplying the precursor to an etching subject arranged in the processing chamber. The etching method includes supplying hydrogen plasma to the inner surface of the discharge tube in which the reactive plasma was generated, and supplying oxygen plasma to the inner surface to which the hydrogen plasma was supplied.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile