Sammu, Japan

Satoru Ishibashi

This inventor holds 21 USPTO granted patents and 2 EPO patents, primarily in Thin Film Technology. Top assignees: Ulvac, Inc., Nihon Shinku Gijutsu Kabushiki Kaisha, Mitsubishi Materials Corporation. Active years: 1992-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Ishibashi. Retrieved from https://idiyas.com/inventor/satoru-ishibashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 57.1


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 96(Granted Patents)


Location History:

  • Narita, JP (1992)
  • Chiba, JP (1993 - 2006)
  • Kanagawa, JP (2008)
  • Sammu, JP (2011 - 2014)
  • Chigasaki, JP (2016)

Company Filing History:


Years Active: 1992-2016

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Areas of Expertise:
Thin Film Transistor
Sputtering Apparatus
Solar Cell Manufacturing
Transparent Conductive Films
Liquid Crystal Display
Touch Panel
Film Forming Process
Wiring Layer
CVD Device
Magnetron Sputtering
Etching Device
Color Filter
21 patents (USPTO):Explore Patents

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I am happy to assist you with the article about inventor Satoru Ishibashi.

Title: Satoru Ishibashi: Innovator in Manufacturing Technologies

Introduction:

Satoru Ishibashi, a prolific inventor based in Sammu, Japan, has distinguished himself with a remarkable portfolio of 21 patents in the field of manufacturing technologies. His latest patents showcase his expertise in developing innovative solutions for mounting devices and sputtering apparatuses.

Latest Patents:

1. Mounting device and method of manufacturing the same: Ishibashi's invention involves a mounting device with a conductive film on a resin substrate. The use of alloy thin films with specific compositions ensures high adhesion to the resin, creating a durable wiring film and metal plug structure.

2. Sputtering apparatus: Ishibashi's sputtering apparatus design enhances target usage efficiency by optimizing magnetic field configurations. This leads to uniform magnetic field strength distribution, preventing erosion in the targets.

Career Highlights:

Throughout his career, Ishibashi has made significant contributions to companies like ULVAC, Inc. and Nihon Shinku Gijutsu Kabushiki Kaisha. His expertise in manufacturing technologies has led to the successful implementation of cutting-edge solutions in the industry.

Collaborations:

Ishibashi has collaborated with peers such as Satoru Takasawa and Noriaki Tani, leveraging their combined skills and knowledge to drive innovation in manufacturing processes. These collaborations have further enriched his contributions to the field.

Conclusion:

In conclusion, Satoru Ishibashi stands as a pioneering inventor in manufacturing technologies, with a track record of developing groundbreaking solutions in mounting devices and sputtering apparatuses. His dedication to innovation and collaboration underscores his enduring impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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