The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2012
Filed:
Jun. 10, 2008
Satoru Takasawa, Sammu, JP;
Sadayuki Ukishima, Sammu, JP;
Noriaki Tani, Sammu, JP;
Satoru Ishibashi, Sammu, JP;
Satoru Takasawa, Sammu, JP;
Sadayuki Ukishima, Sammu, JP;
Noriaki Tani, Sammu, JP;
Satoru Ishibashi, Sammu, JP;
Ulvac, Inc., Chigasaki-shi, JP;
Abstract
A sputtering apparatus according to the present invention is provided with first to fourth targets. The first and the second targets are disposed so that their surfaces face each other. The third and the fourth targets are also disposed so that their surfaces face each other. When a dielectric film is formed, sputtering is alternately performed on the first and the second targets and on the third and the fourth targets. When sputtering is performed on two of the targets having surfaces that face each other, the remaining two targets function as a ground. As a result, abnormal discharges are inhibited.