The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
Sep. 16, 2010
Yasuhiko Akamatsu, Sammu, JP;
Kyuzo Nakamura, Chigasaki, JP;
Motoshi Kobayashi, Sammu, JP;
Junya Kiyota, Sammu, JP;
Tomiyuki Yukawa, Sammu, JP;
Masaki Takei, Sammu, JP;
Yuuichi Oishi, Sammu, JP;
Makoto Arai, Sammu, JP;
Satoru Ishibashi, Sammu, JP;
Yasuhiko Akamatsu, Sammu, JP;
Kyuzo Nakamura, Chigasaki, JP;
Motoshi Kobayashi, Sammu, JP;
Junya Kiyota, Sammu, JP;
Tomiyuki Yukawa, Sammu, JP;
Masaki Takei, Sammu, JP;
Yuuichi Oishi, Sammu, JP;
Makoto Arai, Sammu, JP;
Satoru Ishibashi, Sammu, JP;
Ulvac, Inc., Chigasaki-shi, JP;
Abstract
The present invention is to provide a magnetron sputtering technique for forming a film having an even film thickness distribution for a long period of time. A magnetron sputtering apparatus of the present invention includes a vacuum chamber, a cathode part provided in the vacuum chamber, the cathode part holding a target on the front side thereof and having a backing plate to hold a plurality of magnets on the backside thereof, and a direct-current power source that supplies direct-current power to the cathode part. A plurality of control electrodes, which independently controls potentials, is provided in a discharge space on the side of the target with respect to the backing plate.